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With the 1st NXE:3100, 0.25NA and 0.8σ conventional illumination, being operational at a Semiconductor Manufacturer, we enter the next phase in EUVL implementation. Since 2006 process and early device verification has been done using the two Alpha Demo Tools (ADT's) located at Leuven, Belgium at IMEC and Albany, New York, USA. Now process integration has started at actual Chipmakers sites. This is...
EUV Lithography is targeted for use for sub 40 nm critical level imaging, and the Alpha Demo Tools developed by ASML will be used to help manage the technological risks involved in readying this technology for commercialization. Our work on EUVL has included the design and implementation of key lithography system modules, creating those that are unique to EUVL and combining them with others that build...
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