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Fabrication of Interdigitated Electrodes (IDEs) involves several processes which include oxidation, metallization and photolithography. Among these three processes, photolithography process is the most critical part in the fabrication of IDEs. Photolithography refers to the process of pattern definition by transferring the desired design patterns from a photo-mask/chrome-mask to photoresist (thin...
Our goal is to demonstrate that we can achieve a radical reduction in the capital cost of micro/nano-manufacturing without sacrificing performance by scaling production throughput. As a demonstration of this concept, we show for the first time a DRIE system that processes small substrates (∼1 in2) with performance comparable to commercial systems for a capital cost below $32K. We have designed, built...
In this paper, a novel method is introduced to fabricate nanoscale silicon oxide islands array. Rectangle islands patterns with edge length less than 100 nm are fabricated by traditional contact lithography and buffered oxide etching process. Precise sacrificial layer etching technique is used to control the size of islands from micro-scale to nanoscale accurately. This fabrication method is CMOS...
A nerve block training phantom is being developed for use with ultrasound systems in low-resource environments. Two design options are being pursued: make-as-needed and temporally stable. The make-as-needed design is intended for production within the low-resource environment using locally available materials. The temporally stable design will be produced in the United States and transported to the...
This paper reports the lower cost mirror device composed of the inexpensive glass and the polymer material. This device is a new construction composed of the glass as the substrate and the polymer as the torsion bar. The polymer mirror containing the magnetic particles is used. The device can be fabricated only by the photolithography and wet etching processes. We adopted the actuation system which...
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