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Life testing of M-Type dispenser cathodes was performed for 1000 hours to help quantify the performance enhancement due to different osmium-ruthenium (Os-Ru) thin film microstructures. Os-Ru film microstructures were selected based on their potential to inhibit tungsten/Os-Ru interdiffusion as identified in previous studies. The results show that the 10 W substrate biased 150 nm thick film yielded...
Osmium-ruthenium thin films were deposited on porous tungsten pellets, at the same time as cathode assemblies, to investigate possibilities for minimizing interdiffusion. Previous studies had identified promising film characteristics for inhibiting tungsten interdiffusion. For example, it was found that a 5W-substrate-biased film of 550 nm thickness exhibited high structural and compositional stability,...
In this study, the nanocomposite Ti-Si-N thin films were prepared by reactive magnetron co-sputtering system. The Ti-Si-N film is a mixed composite consisting of the Ti-Si, Ti-N and Si-N compounds. The TiN phase is polycrystalline while SiNx is amorphous. As Si is added to the Ti-N compound to form Ti-Si-N, the microstructure becomes nanocrystalline grains embedded in an amorphous matrix i.e. nanocomposite...
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