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This paper brings a comparison of the traps identified in triple-gate FinFETS and Gate-All-Around (GAA) nanowire (NW) MOSFETs built with the same technological process. Traps have been identified using low frequency noise (LFN) spectroscopy, giving information on which process steps may be improved in order to build better devices.
In this work we present the first Low Frequency Noise results obtained on the new 55 nm BiCMOS technology developed by STMicroelectronics. With this improved technology at higher integration level, SiGe:C Heterojunction Bipolar Transistors will address High Speed & High Data Rate communication systems and smart mobility integrated circuits involved in the future fully automated transportation...
New process conditions involving temperature below 900°C, and then compatible with SOI wafers and CMOS technologies, were successfully developed in order to realize atomic flat interface in MOSFETs. The implementation of these processes did not only reduce the variability of electrical performances but also brought the low frequency noise level down, making MOSFETs fabricated on atomically flat surfaces...
We present, for the first time, Low Frequency Noise measurements in Vertical Organic Transistors. Investigated devices are p-type Metal-Base Organic Transistors employing Pentacene and Copper Phthalocyanine as active layers for the Emitter and Collector regions, respectively. The power spectral densities measured at the Base and Collector terminals follow a 1/fγ law, with γ≈1, suggesting that noise...
We present the low frequency noise and the photoresponse in InP double heterojunction bipolar transistor (DHBT) THz detectors. A current responsivity of 0.23 A/W and a noise equivalent power of 4·10−10 W/Hz1/2 have been measured at 1 kHz modulation frequency. The collector bias can substantially reduce the noise equivalent power.
Low frequency noise (LFN) characteristics can limit the performance of conventional CMOS designs. In the context of this paper enclosed gate N- and P-MOS transistors will be examined regarding LFN mean value and its variability in various biasing conditions. In subthreshold region enclosed gate PMOS transistors show a significantly reduced LFN variability compared to the NMOS counterpart. Both devices...
Terminal voltage fluctuation of lithium-sulfur cells and nickel-metal-hydride cells was measured in different time intervals since cell charging to full capacity. The power noise spectral density is of 1/fα type with exponent a varying in the range from 1 to 1.8. The main noise sources in charge storage systems are: i) fluctuation of potential barrier on the electrode-electrolyte interface (its height...
We discuss the thermal noise and the effect of input noise sources on the output noise of plasmonic Field Effect Transistors operating in a quasi-ballistic regime. The input noise strongly affects the output noise at large signals and when the detectors operate near the threshold, where the highest responsivity is reached. In the detection regime with a finite drain current, 1/f noise becomes dominant...
Low frequency noise is investigated in n-type UTBOX transistors presenting different channel orientations (standard μ100ξ and rotated μ110ξ). It was observed that decreasing temperature reduces the 1/f noise level particularly for a short rotated device. However, unexpected variation of the flicker noise in strong inversion was observed for the long rotated channel. Furthermore, evolution of generation-recombination...
In this paper, Buried-Channel and Native MOSFETs are thoroughly investigated in terms of Low Frequency Noise (LFN) variability for different bias and area conditions. These devices are compared with standard bulk CMOS transistors indicating lower levels of LFN regarding both its mean value and its variability. Moreover a recently proposed compact MOSFET model for LFN and its variability, is validated...
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