The Infona portal uses cookies, i.e. strings of text saved by a browser on the user's device. The portal can access those files and use them to remember the user's data, such as their chosen settings (screen view, interface language, etc.), or their login data. By using the Infona portal the user accepts automatic saving and using this information for portal operation purposes. More information on the subject can be found in the Privacy Policy and Terms of Service. By closing this window the user confirms that they have read the information on cookie usage, and they accept the privacy policy and the way cookies are used by the portal. You can change the cookie settings in your browser.
This paper will examine the influence of ion angle deviation (IAD) on sheet resistance. The IAD is derived from the beam intensity profile measured in the MC3-II/GP medium current implanter. IAD is controlled independently in the horizontal and vertical directions by tuning voltages in the Qlens. It was found that the sheet resistance (Rs) regularly increases with an increase of IAD at a tilt of 0°...
In ion implantation, repeatability of sheet resistances (Rs) is indispensable for process stability monitoring. In the course of process development, we found Rs instability in some implant conditions such as B, 7keV, and 9E13cm2 with tilt of 7 and twist of 22. To understand the reason, we focused on the influence of implant angle conditions and obtained V-Curves for conditions in which the ion...
Set the date range to filter the displayed results. You can set a starting date, ending date or both. You can enter the dates manually or choose them from the calendar.