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For future 65 nm and smaller nodes, thermal anneal processes in the ms and mus range are required. Based on laboratory tests using the line scan method, an R&D system has been developed.
We show that the SU-8 epoxy resist can be exposed by two-photon absorption at 4 K, allowing spectroscopy and lithography to be performed by the same apparatus. We present a systematic study of the exposure parameters.
Laser micro-processing techniques are becoming commonplace in the industrial production of high-tech devices. As the limit of conventional manufacturing is reached, laser micro-processing presents itself as an enabling technology in a wide range of applications.
We will review the status of current laser based crystallization processes, and discuss the specifications and the critical design aspects of the laser and of the optical system developed for the TCZ production tool.
Ultrafast-laser pulsetrain-burst processing (microsecond bursts at 100 MHz) is an option for fluence-delivery which leads to exceptional characteristics of morphology and processing-rates; we describe the background science and application to mitigation of high-power laser-induced damage.
Periodic nanoripples of tungsten on sapphire were grown using linearly-polarized femtosecond laser. The ripple orientation was found parallel to laser polarization. By scanning the substrate, we demonstrated tungsten grating with periodicity around 150 nm.
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