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Thermoelectric solid solutions of Bi 2 (Te 1−x Se x ) 3 with x=0, 0.2, 0.4, 0.6, 0.8 and 1 were grown using the Bridgman technique. Thin films of these materials of different compositions were prepared by conventional thermal evaporation of the prepared bulk materials. The temperature dependence of the electrical conductivity σ, free carriers concentration n, mobility...
In this study, the effect of salt bath cementation on mechanical behavior of SAE 8620 and 16MnCr5 cementation steels, which are widely used in industry, was investigated. The experiments were carried out with hot rolled and cold rolled specimens. The cementation processes were performed in NaCN salt bath at 920 °C temperature for 1, 2, 3 and 4 h. Abrasive wear tests of specimens were conducted with...
A set of sandwich films in the configurations, Fe(200 nm)/Cu(t)/Fe(200 nm); t = 20 nm, 40 nm, 60 nm, 80 nm, 100 nm and 200 nm have been grown using thermal and electron beam gun evaporation techniques at a temperature of 473 K, under high vacuum conditions. The structure and crystallite sizes of the films were investigated by grazing incidence X-ray diffraction (GIXRD). The microstructure was examined...
A DC glow discharge plasma was generated inside polymer tube at low pressure. The polyvinyl chloride (PVC) tube with 4 mm inner diameter and 50 mm length was treated by Ar plasma generated inside the tube. The hydrophilic property of the inner surface of the PVC tube was remarkably improved after the plasma treatment. The water contact angle of the inner surface decreased to 37° from 75° for the untreated...
We have investigated the selective etching of 50 μm diameter via-holes for etch depth >200 μm using 30 μm thick photo resist mask in Inductively Coupled Plasma system with Cl 2 /BCl 3 chemistry. Resultant etch rate/etch profiles are studied as a function of ICP process parameters and photo resist mask sidewall profile. Etch yield and aspect ratio variation with process pressure...
Low-pressure, low-temperature remote oxygen plasma ignited by a radio-frequency (RF) hollow cathode discharge (HCD-L300) system is shown to be a powerful and effective source of neutral atomic oxygen (AO), useful in processing of polymeric materials. The density of AO was determined by a catalytic nickel probe as a function of pressure, RF power, oxygen flow rate and axial distance in the processing...
Structural and morphological investigations on optimized nano-structured gold thin film (under vacuum ∼10 −3 Torr) are reported. The Au optimized thin film was deposited on 4 N polished and analytic grade p-type single crystal (111) Silicon wafer by pulsed laser deposition (PLD) technique, under a vacuum of about 10 −3 Torr at room temperature. The space resolved dynamics of the...
An explanation for the possible mechanism of formation of alumina nanoparticles in Atomic Layer Deposition process of Alumina using Trimethyl aluminum (TMA) and water in a cold wall ALD chamber is given based on the physisorption of TMA and surface energy of alumina thin films. The sorption mechanism proposed is physisorption at the cold walls rather than the conventional chemisorption at the hot...
Experiments show that under suitable conditions the introduction of oxygen can raise the surface ionization current emitted by a heated tungsten wire by several orders of magnitude. The ions in this case are alkali ions originating from alkali silicates normally present as additives in tungsten. From the simultaneous observation, in a varying ambient atmosphere, of both the positive ion current produced...
During low pressure carburizing a carbon layer precipitates on the surface of steel parts. The structure of the carbon layer was tested by means of optical and electron microscopy and Raman spectroscopy as well. It was found out that the carbon layer is composed of fine-crystalline graphite. A sample was carburized (boost step), and was subsequently observed with an optical microscope. The dominant...
In this work, an unconventional approach for epitaxial growth of Si on single-crystalline rare-earth oxide is presented using molecular beam epitaxy under ultra-high vacuum. Surface and bulk crystalline structures as well as chemical content were examined. Silicon-on-insulator layers were fabricated by encapsulated solid phase epitaxy on Si(111) substrate. The gadolinium oxide capping layer was removed...
The plasma-enhanced chemical vapour deposition (PECVD) of amorphous hydrogenated carbon films from pulsed discharges with frequencies in the range from 50kHz to 250kHz was investigated. Five different hydrocarbons (acetylene C 2 H 2 , isobutene C 4 H 8 , cyclopentene C 5 H 8 , toluene C 7 H 8 and cycloheptatriene C 7 H 8 ...
The a-Si:H films with different thickness and microstructure have been deposited with rf-PECVD using a plasma of silane diluted with hydrogen. The structure and optical analysis were carried out by X-ray diffraction, UV–VIS and Raman spectroscopy. Spectral refractive indices, optical energy band gaps, extinction coefficients, phases ratio and grain size were determined as a function of the hydrogen...
The pulsed vacuum arc discharge (pulsed arc) is the most efficient PVD-technology for the deposition of super-hard carbon films on tools and machinery parts. Using the pulsed arc discharge a stable evaporation process of carbon and an efficient deposition of hydrogen-free ta-C type films is possible. In this paper, important properties of such ta-C films and their process conditions are explained...
Molecular dynamic simulation has been used to study how the sputtering characteristics of metal polycrystals are dependent on the mass m 1 of bombarding ions of low-energy E 0 . The influence of target parameters on mass dependence of sputtering has been calculated for Al, Ba, Ce and Au, which were not previously studied. These metals have very different values of density ρ, the lattice...
The active DC glow discharge sustained in pure O 2 and O 2 –Ar mixtures with Ar/O 2 concentration ratios up to 50% has been studied in a Pyrex discharge tube for pressures up to 500 Pa and for discharge currents up to 40 mA. The electric field strength and emission spectra parameters of the discharge were studied by means of the double-probe method and optical emission spectroscopy...
The paper describes the very first observations of the effect of pulsed gas injection to the coaxial accelerator during impulse plasma deposition (IPD) on the structure and properties of deposited material. As a test material a TiN coating deposited on high-speed steel substrates was chosen. The morphology and wear-resistance properties were determined. The structure obtained with modified IPD method...
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