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In this work, mass spectrometry and optical emission spectroscopy techniques were used to monitor the molecular and atomic neutral species during SF 6 /CF 4 , SF 6 /O 2 and CF 4 /O 2 plasmas generated in a radio-frequency Hollow Cathode Reactive Ion Etching (HCRIE) reactor keeping constant the following operational conditions: total gas flow rate, gas...
Low pressure inductively coupled plasma was investigated with a combination of two diagnostic techniques: catalytic probes and optical emission spectroscopy (actinometry). Three working gases were used: oxygen, oxygen–argon mixture and hydrogen. Concentrations of oxygen and hydrogen atoms were determined in a wide range of plasma parameters, with pressure ranging from 10 Pa to 70 Pa, applied power...
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