The Infona portal uses cookies, i.e. strings of text saved by a browser on the user's device. The portal can access those files and use them to remember the user's data, such as their chosen settings (screen view, interface language, etc.), or their login data. By using the Infona portal the user accepts automatic saving and using this information for portal operation purposes. More information on the subject can be found in the Privacy Policy and Terms of Service. By closing this window the user confirms that they have read the information on cookie usage, and they accept the privacy policy and the way cookies are used by the portal. You can change the cookie settings in your browser.
Silacyclobutane and silacyclopentane were synthesized for evaluations as precursors for silicon dioxide films under lowpressure chemical vapor deposition conditions at low temperatures. Both silacyclobutane and silacyclopentane were studied in the temperature range from 300°C to 500°C in the presence of oxygen. Deposition rates follow an Arrhenius behavior at constant reactor pressure, and the activation...
It is shown that for optimization of Auger depth profiling of the multilayer structures Mo/Si, Mo/B 4 C, Ni/C with superthin layers it is necessary to reduce the sputtering ion energy to lower than 1 keV. High-resolution Auger depth profiles of multilayers Mo/Si and Mo/B 4 C with 100% component modulation in adjacent layers, are obtained at an Ar + -ion energy of 0.6–1 keV...
Set the date range to filter the displayed results. You can set a starting date, ending date or both. You can enter the dates manually or choose them from the calendar.