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Recovery of base metals, silicon and fluoride ions from mobile phone printed circuit boards after leaching with hydrogen fluoride and hydrogen peroxide mixtures
Analytical Chemistry Department, Institute of Chemistry, Federal University of Rio de Janeiro, Av. Athos da Silveira Ramos, 149, Room A509, 21941-909 Ilha do Fundão, Rio de Janeiro, Brazil
Analytical Chemistry Department, Institute of Chemistry, Federal University of Rio de Janeiro, Av. Athos da Silveira Ramos, 149, Room A509, 21941-909 Ilha do Fundão, Rio de Janeiro, Brazil
Analytical Chemistry Department, Institute of Chemistry, Federal University of Rio de Janeiro, Av. Athos da Silveira Ramos, 149, Room A509, 21941-909 Ilha do Fundão, Rio de Janeiro, Brazil
Analytical Chemistry Department, Institute of Chemistry, Federal University of Rio de Janeiro, Av. Athos da Silveira Ramos, 149, Room A509, 21941-909 Ilha do Fundão, Rio de Janeiro, Brazil
Chemistry and Nuclear Materials Department, Institute of Nuclear Engineering, Rua Hélio de Almeida, 75, 21941-906 Ilha do Fundão, Rio de Janeiro, Brazil
Chemistry and Nuclear Materials Department, Institute of Nuclear Engineering, Rua Hélio de Almeida, 75, 21941-906 Ilha do Fundão, Rio de Janeiro, Brazil
Chemistry and Nuclear Materials Department, Institute of Nuclear Engineering, Rua Hélio de Almeida, 75, 21941-906 Ilha do Fundão, Rio de Janeiro, Brazil