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A topography simulation of BiCS memory hole etching is performed. The model parameters are fitted by elementary experiments of Si and SiO2 etching, and BiCS topography simulation is performed without parameter fitting. Our new model describes the experimental topography of BiCS memory hole, including taper angles and undercuts of stacked films. The point of the modeling is that it takes into consideration...
A tight-binding method is applied to optimized Si-cluster surrounded by SiO2. As a result, it is found that the energy band structure is quite different from that of Si-substrate. It is regarded that the band-gap is invaded from the conduction band by intrinsic interfacial states.
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