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An array of electrodes covering one-sixth of the area of an 8" wafer was developed as a prototype system for NC sacrificial plasma oxidation. It was demonstrated that the system can be used for simultaneous NC processes by the individual control of the plasma-on time of each electrode.
The concept of column-less SEM using field emitter with a multi-stacked electrostatic lens (multi-gate FE) is proposed. To realize the column-less SEM, we revised fabrication process of the multi-gate FE.
This paper reports the successful fabrication of a field emitter array with a built-in multi-electrode lens, such as a quad-gate and a penta-gate FEA. The fabrication is based on an etch-back technique.
A photon-counting mode X-ray imaging device has a lot of interests, such as high-sensitivity and energy-discrimination. We have studied about photon-counting mode X-ray image sensor which was constructed with CdTe, and already developed for the line sensor. The imaging device that could detect X-rays by using Field Emitter Array (FEA) was proposed. The resolution of the image is decided by the spot...
Nanovision science proposed by the author et al. plans to introduce nanoarea control of individual photons and electrons into image engineering. In the nanovison imaging devices such as image pick-up devices and displays we reduce one pixel size to be less than 1 mum. Electron beam can be focused on nanoarea by using an appropriate lens system. Therefore, vacuum nanoelectronics is a powerful tool...
Using a method of numerically controlled sacrificial oxidation, the dispersion of the thickness of the silicon layer of a 300 mm SOI wafer was successfully improved from PV: 2.4 nm to PV 0.9 nm.
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