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We use carrier frequency interferometry to determine the radius of curvature of amorphous thin films deposited onto thick substrates with high accuracy with a relatively simple setup.
We demonstrate that trapping of femtosecond laser pulses of relativistic intensity deep within nanowire arrays volumetrically heats matter into a new ultra-hot plasma regime with electron densities nearly 100 times critical and multi-keV temperatures.
We show the laser damage resistance of ion beam sputtered Ta2O5/SiO2 for high energy lasers can be increased by 50% when the Ta2O5 in the top few layers of the stack is replaced by HfO2 or Y2O3.
Extreme ultraviolet lithography (EUVL) has been selected to print a new generation of semiconductor chips at the 22 nm half-pitch node and beyond. This technology has been demonstrated at laboratory and beta-tool scales but several technological issues, including the fabrication of defect-free masks, need to be addressed before it can be implemented for mass production of chips. In support of EUVL,...
We present results with different nanopatterning techniques using table top extreme ultraviolet lasers. The three approaches are interferometric lithography, Talbot self imaging and holographic projection lithography.
We report on a reflection microscope that operates at 13.2-nm wavelength with a spatial resolution of 55 plusmn 3 nm. The microscope uses a table-top EUV laser to acquire images of photolithography masks in 20 seconds.
Experiments and modeling reveal that the dielectric breakdown of hafnia films is controlled by laser induced and native defects under multiple femtosecond pulse exposure. Transient processes occur on a 100 ps and 10 ms timescale.
We report the ablation of 200 nm-top wide (130 nm FWHM) trenches on PMMA photoresist by focusing the extreme ultraviolet output from a table-top capillary discharge laser with a Fresnel zone plate lens.
We have developed a numerical algorithm that, applied to extreme ultraviolet (EUV) micrographs, allows for the simultaneous determination of the spatial resolution and the size of the features of the image. The validity of the method was evaluated by analyzing EUV images.
A compact full-field photon-based microscope based on a desktop-size 46.9 nm wavelength extreme ultraviolet laser that captures images with a single nanosecond laser pulse and with a measured spatial resolution of 54 nm is described.
We describe a correlation algorithm that allows for the simultaneous determination of object size and resolution in images of nanoscale objects. The method was used to analyze images recorded with a 13.2 nm laser.
Holographic images of carbon nanotubes 50–80 nm in diameter were obtained with a spatial resolution matching the wavelength of the compact capillary discharge extreme ultraviolet (EUV) laser used for illumination, 46.9 nm.
We use curvature correction and high-numerical-aperture imaging to demonstrate a soft-x-ray diffraction microscope with 70–90 nm resolution using two tabletop coherent sources. This near-diffraction-limited resolution of 1.5λ is a first for x-ray diffractive imaging.
We describe a correlation algorithm that allows for the simultaneous determination of object size and resolution in images of nanoscale objects. The method was used to analyze images recorded with a 13.2 nm laser.
We demonstrate an amplitude division interferometer that using illumination from a high brightness desk top extreme ultraviolet (EUV) laser creates large area arrays of lines, holes and dots with sub-100nm feature size.
We have realized the first demonstration of imaging in the extreme ultraviolet (EUV) with near-wavelength spatial resolution, 54 nm, using a uniquely compact full-field microscope that can produce images with a single one nanosecond exposure.
We use curvature correction and high-numerical-aperture imaging to demonstrate a soft-X-ray diffraction microscope with 70-90 nm resolution using two tabletop coherent sources. This near-diffraction-limited resolution of 1.5lambda is a first for X-ray diffractive imaging.
We describe a correlation algorithm that allows for the simultaneous determination of object size and resolution in images of nanoscale objects. The method was used to analyze images recorded with a 13.2 nm laser.
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