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In this x-ray photoelectron spectroscopy (XPS) study ultra-thin Si and MnO films were deposited on a range of low dielectric constant carbon doped oxides (CDO) with varying carbon content, in order to accurately determine the binding energy (BE) positions of the Si 2p and O 1s core level peaks as a function of carbon concentration. The results show a measurable correlation between carbon content and...
Synchrotron radiation photoelectron spectroscopy (SRPES) is used to investigate the in-situ formation of ultra thin Mn silicate copper diffusion barrier layers on SiO2. It was shown that high temperature annealing results in the growth of Mn silicate, the stoichiometry of which was calculated to be MnSiO3. SRPES results also show that the interaction of metallic Mn with SiO2 is self limiting at high...
In this study Mn silicate (MnSiO3) barrier layers were formed on ultra low dielectric constant (ULK) carbon doped oxide (CDO) surfaces, using both metallic Mn and oxidized Mn films. Using x-ray photoelectron spectroscopy (XPS) it has been shown that deposition of metallic Mn and partially oxidised Mn (MnOx where x < 1) films on CDO surfaces results in the formation of both MnSiO3 and a Mn...
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