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Design automation (DA) research has for over fifty years been performed in academia, semiconductor and system companies, and EDA companies worldwide. This research has been enabling to continued scaling of design productivity and growth of the semiconductor industry. For product companies, funding program managers and individual researchers alike, a highly relevant question is: what DA research, and...
In this paper, we discuss emerging nanolithography technologies including double/multiple patterning, extreme ultra-violet lithography, electron-beam lithography, and their interactions with VLSI CAD. These technologies all have different manufacturing processes with their own challenges/issues. Meanwhile, nanometer VLSI designs and mask synthesis have to be co-optimized with these process technologies...
As the CMOS feature enters the era of extreme scaling (14nm, 11nm and beyond), manufacturability challenges are exacerbated. The nanopatterning through the 193nm lithography is being pushed to its limit, through double/triple or more general multiple patterning, while non-conventional lithography technologies such as extreme ultra-violet (EUV), e-beam direct-write (EBDW), and so on, still have grand...
Design rule has been a primary metric to link design and technology, and is likely to be considered as IC manufacturer's role for the generation due to the empirical and unsystematic in nature. Disruptive and radical changes in terms of layout style, lithography and device in the next decade require the design rule evaluation in early development stage. In this paper, we explore VLSI CAD researches...
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