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We study, in detail, statistical threshold voltage variability in a state of the art n-channel MOSFET introduced by line edge roughness. A large sample of 35,000 transistors with microscopically different LER patterns was simulated using the Glasgow 3D `atomistic' device simulator. Such large-scale simulation has been enabled by advanced grid computing technology. The results show that the statistical...
Using the Glasgow ldquoatomisticrdquo simulator, we have performed 3D statistical simulations of random-dopant-induced threshold voltage variation in state-of-the-art 35- and 13-nm bulk MOSFETs consisting of statistical samples of 105 or more microscopically different transistors. Simulation on such an unprecedented scale has been enabled by grid technology, which allows the distribution and the monitoring...
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