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Mg-doped colloidal silica abrasive was synthesized by seed-induced growth method. A detailed analysis was presented to characterize the composition and morphology of Mg-doped colloidal silica abrasive by using time-of-flight secondary ion mass spectroscopy and scanning electron microscopy. The chemical mechanical polishing performances of the Mg-doped colloidal silica abrasive on silicon wafer were...
Abrasive-free polishing has been used for nickel-phosphorus (Ni-P) coating hard disk substrates to achieve global planarization of topography with a low post-planarization slope. Benzoyl peroxide (BPO)-H2O2 slurry in abrasive-free polishing of hard disk substrate was developed in our previous work, but its material remove rate is relatively low. In this paper, N, N-dimethyl aniline is introduced to...
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