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In this work, we provide early insight into the combined tradespace for both power switching and RF applications afforded by the high critical, electric-field strength of β-Ga2O3. MOSFETs formed by homoepitaxial growth of β-Ga2O3 films doped with Sn, Si, and Ge on bulk substrates have been characterized electrically. Several key milestones have been achieved such as enhancement-mode operation >...
We report on MOSFETs fabricated on Ge-doped $\beta $ -Ga2O3 homoepitaxial material grown by molecular beam epitaxy on (010) Fe-doped semi-insulating substrates. The Ge-doped channel devices performed similar to previously reported devices with Sn- and Si-doped channels with the drain current ON/OFF ratios of $> 10^{8}$ and the saturated drain current of >75 mA/mm at $V_{G}=0$ V. Hall effect...
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