The Infona portal uses cookies, i.e. strings of text saved by a browser on the user's device. The portal can access those files and use them to remember the user's data, such as their chosen settings (screen view, interface language, etc.), or their login data. By using the Infona portal the user accepts automatic saving and using this information for portal operation purposes. More information on the subject can be found in the Privacy Policy and Terms of Service. By closing this window the user confirms that they have read the information on cookie usage, and they accept the privacy policy and the way cookies are used by the portal. You can change the cookie settings in your browser.
Gas-based ion implantation with halogen containing compounds, especially fluorine, or oxygen, cause high stress on source materials such as tungsten and molybdenum. Sources can fail prematurely stemming from a reaction between halogen or oxygen ions in the source plasma with the source materials. Based on well-established Plansee refractory metals (RM = W, WL, Mo) a range of new materials with Carbon...
Many plasma facing surfaces are prone to corrosion due to aggressive environment in ion implantation sources. Tungsten materials are commonly used because of their high chemical and temperature stability. To further improve the plasma resistance of tungsten, a method was developed to provide the parts with a coating containing tungsten carbide or tungsten boride. Through depositing carbon and / or...
Set the date range to filter the displayed results. You can set a starting date, ending date or both. You can enter the dates manually or choose them from the calendar.