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In this paper, we studied defect discovery and defect review using back-scattered electron (BSE) images. We found that some defects can only be effectively imaged with BSE mode such as hafnium oxide remain at metal gate chemical mechanical polishing (CMP) in the gate last high-k metal gate (HKMG) process. It can also enhance contrast for materials in the bottom of high aspect ratio (HAR) trenches...
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