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An innovative concept in the development of advanced coating deposition and ion implantation method including an application of filtered DC metal plasma source and high-frequency short-pulsed negative bias voltage with a duty factor in the range 10 ÷ 99% are considered. The regularities of ion implantation and metal plasma deposition for dielectric samples are theoretically and experimentally investigated...
The regularities of the nitrogen and argon plasma formation in a hollow cathode with the volume up to 0.2–0.5 m3 using the short-pulsed (1–10 μs) high-frequency (100 kHz) voltage to 3 kV are presented in the paper. It is shown that despite the pulsed nature of voltage, the gaseous discharge steadily burns at the pressure of 0.1 Pa and higher, the discharge current value and plasma concentration grow...
An innovative concept in the development of advanced coating deposition and ion implantation method including an application of filtered DC metal plasma source and high-frequency short-pulsed negative bias voltage with a duty factor in the range 10 ÷ 99% are considered. The regularities of ion implantation and metal plasma deposition for metal samples are theoretically and experimentally investigated...
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