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A wafer-to-wafer inspection of microsystems is a promising approach for a parallel and thus high speed characterization in particular for MEMS and MOEMS. The probing wafers aligned above the M(O)EMS wafer consists of arrays of micro-optical interferometers for the shape-, deformation-, resonance-characterization. In this contribution we show that binary nano-optical gratings in the resonance domain...
Analogue lithography is a suitable technology for the fabrication of continuous surface profiles. This paper summarises investigations on the electron beam exposure of PMMA and HEBS-glass masks. At first we give an idea of the intermittence effect we obtained by exposing PMMA and HEBS-glass masks with a variable shape beam e-beam writer. To understand its physical causes, the intermittence effect...
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