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Surface nanomechanical properties of ZrN and ZrCN films deposited on NiTi shape memory alloy (SMA) by magnetron sputtering were investigated by nanoindentation study. And their surface deformation mechanism under nanoindentation load was also proposed and discussed by comparison with that of the electropolished NiTi SMA.
Plasma-based technologies such as plasma immersion ion implantation and deposition (PIII&D) are widely used. In addition to the capability to alter the materials surface, novel microelectronic structures can be fabricated. In this invited paper, our recent research activities on the application of plasma technologies to microelectronics are reviewed. Silicon-on-insulator (SOI) is replacing conventional...
The materials surface plays an extremely important role in the response of the biological environment to the artificial medical devices. The initial protein interactions with implant surfaces are very important and therefore, it is clear that if the surface morphology, structure, composition, and properties are changed, cell functions are influenced. Nanoscale materials are thought to interact with...
The use of SiO2 thin films as the gate dielectric is quickly reaching a limitation due to the rapid increase in tunneling current and worsened device reliability. A logical alternative is to use a gate insulator with a higher relative dielectric constant (high-k) than silicon dioxide (3.9), thereby spurring tremendous research activities to produce better high-k gate dielectric materials. In this...
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