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Plasma-based technologies such as plasma immersion ion implantation and deposition (PIII&D) are widely used. In addition to the capability to alter the materials surface, novel microelectronic structures can be fabricated. In this invited paper, our recent research activities on the application of plasma technologies to microelectronics are reviewed. Silicon-on-insulator (SOI) is replacing conventional...
The materials surface plays an extremely important role in the response of the biological environment to the artificial medical devices. The initial protein interactions with implant surfaces are very important and therefore, it is clear that if the surface morphology, structure, composition, and properties are changed, cell functions are influenced. Nanoscale materials are thought to interact with...
Silicon-Oxynitride (Si-N-O) films were fabricated on silicon wafers by silicon cathodic arc combined with plasma immersion ion implantation and deposition. The blood compatibility of the films was assessed by platelet-adhesion test and fibrinogen conformational change measurements to evaluate the viability of the materials in biomedical engineering. Significantly, a better platelet-adhesion behavior,...
Summary form only given. Doped with selected impurities has been shown to be an attractive approach to enhance the properties of amorphous carbon or diamond-like carbon (DLC) films for different application. The surface, mechanical, biological and other properties can be selectively enhanced. In this work, we fabricated calcium, sodium, and phosphorus doped carbon films and evaluated their surface...
Summary form only given. The filtered pulsed cathodic vacuum arc (FCVA) technique is designed to produce plasmas from solid targets. Single element target is traditionally employed, but it cannot satisfy the needs when two or more elements are needed for plasma implantation or deposition. Introducing gases into the chamber and using alloys or composite targets are some of the solutions. These methods,...
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