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We present two kinds of novel nanoimprint lithography techniques based on SU-8 photoresist with single layer and tri-layer approaches. The imprint templates with high aspect ratio were first fabricated by electron beam lithography (EBL) and reactive ion etch (RIE), and then duplicated by the SU-8/SiO2/PMMA tri-layer technique we developed. Imprint properties such as pressure and temperature are determined...
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