The Infona portal uses cookies, i.e. strings of text saved by a browser on the user's device. The portal can access those files and use them to remember the user's data, such as their chosen settings (screen view, interface language, etc.), or their login data. By using the Infona portal the user accepts automatic saving and using this information for portal operation purposes. More information on the subject can be found in the Privacy Policy and Terms of Service. By closing this window the user confirms that they have read the information on cookie usage, and they accept the privacy policy and the way cookies are used by the portal. You can change the cookie settings in your browser.
Novel wafer-level chip scale package (WL-CSP) applicable to configurations involving stacking of multiple dies has been developed. Since stacked die makes high topography and it is difficult to apply conventional WL-CSP process, gold bonding wires were used for not only connecting stacked dies with one another but also for connecting from each die to CSP terminals. The WL-CSP is also applicable to...
This paper reports a thin-film encapsulation technology for wafer level micro-electro-mechanical systems (MEMS) package, using poly-benzo-oxazole (PBO) sacrificial material and plasma enhanced chemical vapor deposited silicon oxide (PECVD SiO) cap layer. This technique, which is applicable for MEMS technologies, saves die size and enables conventional package processes such as dicing, picking, mounting...
In this paper, we report in-line wafer level hermetic packages (WLP) for MEMS variable capacitors. The beam structure of MEMS vibrates strongly under decompression. Since this vibration causes RF noise, it is necessary to set the pressure around the beam structure at 40000Pa or greater. Therefore, a structure that carries out a resin seal of the hole for etching the cap of a formed in the sacrificial...
Environmental emission volume of green house gases such as SF6 and C4F8, consumed for Si deep etching process in MEMS fabrication, are increasing followed by the MEMS market growth. To reduce the emitted green house gases, alternative C3F6 and IF5 were investigated to be applied for MEMS etching process instead of conventional Bosch process gases. The C3F6 and IF5 gases have very small global warming...
Set the date range to filter the displayed results. You can set a starting date, ending date or both. You can enter the dates manually or choose them from the calendar.