The Infona portal uses cookies, i.e. strings of text saved by a browser on the user's device. The portal can access those files and use them to remember the user's data, such as their chosen settings (screen view, interface language, etc.), or their login data. By using the Infona portal the user accepts automatic saving and using this information for portal operation purposes. More information on the subject can be found in the Privacy Policy and Terms of Service. By closing this window the user confirms that they have read the information on cookie usage, and they accept the privacy policy and the way cookies are used by the portal. You can change the cookie settings in your browser.
This paper describes the fabrication process and device performance of CMOSFET with direct silicon bonded (DSB) substrate. This works offers the first comprehensive evaluation of source/drain engineering for DSB devices. Scanning spreading resistance microscopy (SSRM) technique reveals specific dopant profile that lateral diffusion along the bonding interface, in addition to the highly activated dopant...
The SSRM in vacuum is proven to have sufficiently high spatial resolution for 2D profiling of ultra-shallow junctions of ~10 nm. An extremely small effective probe radius of 0.5 nm has been shown to be available with our SSRM systems. Halo distribution influence on roll-off characteristics has been directly observed. SSRM has been shown to have great potential for 2D characterization of next-generation...
Two-dimensional characterization of ultra-shallow junction CMOSFETs is performed by scanning spreading resistance microscopy (SSRM). Reproducible SSRM images with high spatial resolution are obtained by measuring in vacuum, and the wearing out characteristics of probes are also improved. Halo distribution of ultra-shallow junctions has very limited lateral diffusion and shows variation with decreasing...
Set the date range to filter the displayed results. You can set a starting date, ending date or both. You can enter the dates manually or choose them from the calendar.