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Uniformity doping, δ-doping and growth-interruption doping to produce gallium nitride (GaN): Mg has been investigated by low-pressure metal-organic chemical vapor deposition (LP-MOCVD). It was demonstrated by electrical, optical, and surface studies that films produced by growth-interruption-Mg-doping produce the best crystal quality, this doping method increasing self-compensation because of the...
InGaN/GaN multiple quantum well (MQW) structures were grown by MOCVD. A strain-relief underlying layer was employed to reduce the strain in the InGaN well layers arising from the large lattice mismatch between InN and GaN. Samples were investigated by photoluminescence (PL), electroluminescence (EL) and atom force microscopy (AFM) to characterize their optical and morphological properties. By inserting...
Different InGaN/GaN multi quantum wells (MQWs) structures were grown by metalorganic chemical vapor deposition (MOCVD). Samples were investigated by photoluminescence (PL), atom force microscopy (AFM) and double crystal X-ray diffractometry (DCXRD) to character their optical, morphological and crystal properties. By inserting the strain relief layer, the PL intensity was increased more than two times...
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