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The most promising technologies of silicon nitride hydrogenated layers for application in solar cells are based on plasma-chemical methods. In this paper, results concerning radio-frequency plasma-enhanced chemical vapour deposition (RF PE CVD) method applied in the technology of a-Si x N y :H layers on glass and polycrystalline silicon are presented. For the purpose of this research...
Al-doped ZnO films were prepared by the dc magnetron sputtering technique on Suprasil-1 substrates at a temperature of 470K. Plasma-emission monitoring was used to stabilize oxygen flow to the deposition chamber. The effect of substrate position during deposition on the structural, electrical and optical properties of the films was investigated. It was found that preparation of low-resistance films...
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