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A highly accurate focus estimation technique that uses scatterometry has been developed for hole photolithography processes. In this technique, scatterometry is used to measure the resist depths, the sidewall angle, and the top and bottom widths of a hole pattern. The relation between these four parameters is then used to estimate the focus and dose by nonlinear regression and the maximum likelihood...
A good reliable approach to cardiac triggering is of utmost importance in obtaining accurate quantitative results of atherosclerotic plaque burden from the analysis of IntraVascular UltraSound sequences. Although, in the last years, there has been an increase in research of methods for retrospective gating, there is no general consensus in a validation protocol. In this paper, we propose an objective...
In this paper, we experimentally evaluated the effect of outlier detection methods to improve the prediction performance of fault-proneness models. Detected outliers were removed from a fit dataset before building a model. In the experiment, we compared three outlier detection methods (Mahalanobis outlier analysis (MOA), local outlier factor method (LOFM) and rule based modeling (RBM)) each applied...
Highly sensitive focus measurement method using scatterometry has been developed. Since the method is nondestructive and applicable to wafers with film stacks, it enables to apply for production wafers. Focus change results in subtle variation of the photo resist (PR) shape. We parameterized this phenomenon by scatterometry with novel model consisting of 8 layers. The focus was obtained by the modeled...
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