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This paper demonstrates and experimentally reports the highest ever performance boosting in strained silicon-nanowire homojunction TFETs with negative capacitance, provided by matched PZT capacitors. Outstanding enhancements of Ion, gm, and overdrive are analyzed and explained by most effective reduction of body factor, m < 1, especially for Vg>Vt, which greatly amplify the control on the surface...
Schottky barrier (SB)-MOSFETs with NiSi and epitaxial NiSi2 S/D contacts with gate lengths as small as 20 nm are presented. Epitaxial NiSi2 FETs show higher on-currents than corresponding NiSi devices due to its lower SB height. A striking observation is that tunnelling currents through the fairly large SB decrease at very short gate lengths in SB-MOSFETs, in contrast to the scaling behavior of conventional...
Compressively strained Si1-xGex band-to-band tunneling field effect transistors with planar structure and HfO2/TiN gate stack have been produced and analyzed, with different Germanium concentrations of x = 0.35, 0.50 and 0.65. Simulations using a nonlocal band-to-band-tunneling model have been carried out to understand the switching behavior and its dependence on the material parameters. One would...
In the last few years, many efforts have been made looking for the improvement of the DC and RF performance of MOS transistors. In this scope, Schottky-Barrier transistors appear as very interesting alternative to conventional devices. In this paper we present the non-linear behavior of dopant segregated n-type SB-MOSFETs with 180 nm channel length.
Recent experimental results on Si nanowire MOSFETs are presented. The devices were fabricated in a top-down approach on unstrained and biaxial strained SOI substrates exhibiting good I-V characteristics with Ion/Ioff-ratios of 107 and off-currents as low as 10-13 A. Subthreshold slopes of about 70 mV/dec for SOI n- and p-FETs and 65 mV/dec for strained SOI n-FETs were obtained. The on-current and...
In this paper, we present fully-depleted Schottky barrier MOSFETs with dopant-segregated NiSi source and drain junctions. Schottky barrier MOSFETs with a channel length of 80 nm show high on-currents of 900 muA/mum for n-type devices with As segregation and 427 muA/mum for p-type devices with B segregation, respectively. A detailed high-frequency characterization proves the high performance of the...
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