The Infona portal uses cookies, i.e. strings of text saved by a browser on the user's device. The portal can access those files and use them to remember the user's data, such as their chosen settings (screen view, interface language, etc.), or their login data. By using the Infona portal the user accepts automatic saving and using this information for portal operation purposes. More information on the subject can be found in the Privacy Policy and Terms of Service. By closing this window the user confirms that they have read the information on cookie usage, and they accept the privacy policy and the way cookies are used by the portal. You can change the cookie settings in your browser.
A maskless approach of forming p‐doped regions in Si wafers using the Ga source of a standard focused ion beam (FIB) system and the moderate activation temperatures of 400–700 °C is demonstrated in this work. This simple and flexible route is accessible to many research labs and is successfully used to fabricate Si‐based diodes and field‐effect transistors (FETs). For the diodes, tunneling is found...
This work describes the fabrication of anisotropically etched, faceted pyramidal structures in amorphous layers of silicon dioxide or glass. Anisotropic and crystal‐oriented etching of silicon is well known. Anisotropic etching behavior in completely amorphous layers of silicon dioxide in combination with purely isotropic hydrofluoric acid as etchant is an unexpected phenomenon. The work presents...
In this work, the precursor tert-butylimido-tris-ethylmethylamido-tantalum (TBTEMT) was applied for the atomic layer deposition (ALD) of tantalum oxide (Ta2O5) thin films for the first time. Water was used as the second reactant. A self-limiting, and hence, ALD-like film growth was confirmed in the temperature range from 100 to 300°C. The temperature window of this process extends from 250 to 300°C...
Set the date range to filter the displayed results. You can set a starting date, ending date or both. You can enter the dates manually or choose them from the calendar.