The Infona portal uses cookies, i.e. strings of text saved by a browser on the user's device. The portal can access those files and use them to remember the user's data, such as their chosen settings (screen view, interface language, etc.), or their login data. By using the Infona portal the user accepts automatic saving and using this information for portal operation purposes. More information on the subject can be found in the Privacy Policy and Terms of Service. By closing this window the user confirms that they have read the information on cookie usage, and they accept the privacy policy and the way cookies are used by the portal. You can change the cookie settings in your browser.
We investigated field‐effect passivation by injecting negative charges into SiO2/SiNx stack using a plasma charge injection technique. The Si/SiO2/SiNx samples exhibited a very high flat‐band shift with a high injected negative charge density (>3.0 × 1013 cm2) after plasma negative charge injection; this density was higher than that for the well‐known Al2O3 layer. Most injected negative charges...