The Infona portal uses cookies, i.e. strings of text saved by a browser on the user's device. The portal can access those files and use them to remember the user's data, such as their chosen settings (screen view, interface language, etc.), or their login data. By using the Infona portal the user accepts automatic saving and using this information for portal operation purposes. More information on the subject can be found in the Privacy Policy and Terms of Service. By closing this window the user confirms that they have read the information on cookie usage, and they accept the privacy policy and the way cookies are used by the portal. You can change the cookie settings in your browser.
This paper reports a simple method to create silicon nano tips in post self-assembled monolayer (SAM)-based anisotropic wet etching. To demonstrate the fabrication feasibility, different local etch rates at stressed surfaces at hemispherical silicon specimens in surfactant-added etchants compared to those on flat silicon surfaces have been measured, which are explained as the enhanced adsorption of...
We use the surfactant-modified wet anisotropic etching, a promising micromachining technique we have recently focused on, to fabricate sharp silicon tips with high aspect ratio without additional sharpening by thermal oxidation. Because of the intriguing variation of etching characteristics in surfactant-added solutions as compared to traditional etchants, tips possessing a front angle of about 18°...
Set the date range to filter the displayed results. You can set a starting date, ending date or both. You can enter the dates manually or choose them from the calendar.