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The elastic modulus of a variety of porous low dielectric constant thin films with porosities in the range of 24–47% and thicknesses between 148 and 235 nm is calculated using the Oliver–Pharr method, an intrinsic thin film model based on the Li‐Vlassak method, and finite element simulations in the elastic regime by taking the tip imperfections into account. It is shown that the substrate effects...
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