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The hot-carrier (HC) effect in high-/metal-gate nMOSFETs is characterized using radio-frequency (RF) small-signal parameter analysis. To explain a novel HC degradation of RF small-signal parameters, we propose a modified surface channel resistance model that can be applied to not only conventional /poly-Si-gate nMOSFETs but also high-/metal-gate nMOSFETs.
RF performances of 100-nm metal gate/high-k dielectric nMOSFET and parameters degradation by hot carrier injection to apply to RF integrated circuits are investigated. The attained nMOSFETs RF performances are 132-GHz fT and 44-GHz fmax. In addition to RF figures of merit (FOM, fT and fmax), variation of capacitance and resistance is monitored to study hot carrier effects.
We investigate RF performances and hot carrier effects of nMOSFETs at cryogenic temperature. RF performances of HfO2 dielectric nMOSFET at 77 K are improved more than those of SiO2 dielectric nMOSFET although DC performances are improved similarly. The nMOSFET with HfO2 dielectric has 127.4 GHz fT and 75.4 GHz fmax at 77 K. In hot carrier injection measurement, gm of HfO2 nMOSFET at 77 K is degraded...
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