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We present in this paper, a study of Dc, RF and Noise characteristics of an industrial metamorphic HEMT (High Electron Mobility Transistor) operating under low voltage at cryogenic temperature. The results at 300K are compared with the obtained results at cryogenic temperature. Temperature decrease makes device characteristics improve. This improvements allow to expect to develop a low power cryogenic...
The gate-recess technology for Si delta-doped InAs/AlSb high-electron-mobility transistors (HEMTs) has been investigated by combining atomic force microscopy (AFM) inspection of the gate-recess versus time with electrical device characterization. Deposition of the gate metal on the In0.5Al0.5As protection layer or on the underlying AlSb Schottky layer resulted in devices suffering from high gate-leakage...
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