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Doping of Ga(Al)N layers by plasma-assisted molecular beam epitaxy in Ga-rich conditions on c-plane bulk GaN substrates was studied. Ga(Al)N samples, doped with Mg or Si, grown using different growth conditions were compared. In contrast to Si doped layers, no change in the Mg concentration was observed for layers grown using different growth rates for a constant Mg flux and constant growth temperature...
An overview of recent results concerning THz detection related to plasma nonlinearities in nanometer field effect transistors is presented. In particular, the research on the dynamic range of these detectors is described and two different technologies GaAs and GaN are compared. As a conclusion, we will show first real world applications of the plasma field effect transistors based THz detectors: demonstrators...
This work presents results of investigations of lateral and vertical Schottky diodes based on Molecular Beam Epitaxy (MBE) grown GaN/AlGaN heterostructures. We have used plasma assisted molecular beam epitaxy in metal rich conditions on freestanding GaN commercial substrates and GaN/sapphire heterosubstrates. The optimized technological procedures have been used to avoid parasitic conduction channels...
We report on epitaxial growth, processing, characterization and firsts photoresponse experiments performed on GaN/AlGaN lateral Schottky barrier diodes. The epitaxial GaN/AlGaN epistructures were fabricated by molecular beam epitaxy under metal rich conditions on the freestanding GaN substrates. The lateral Schottky barrier diodes were performed using modified transistor processing, which was based...
We present results of investigations of Plasma Assisted Molecular Beam Epitaxy (PAMBE) - grown GaN/AlGaN High Electron Mobility Transistor (HEMT) structures for fabrication of detectors and emitters operating in THz spectral range. These devices are standard HEMT structures but equipped with additional antennas that ensure THz radiation coupling. THz detectors and emitters were processed using different...
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