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The high frequency plasma enhanced chemical vapor deposition (HF-PECVD) is a well applicable deposition technique for large area and high rate deposition for silicon thin film solar cell application. This paper presents the properties of hydrogenated amorphous silicon (a-Si:H) films and high efficiency of p-i-n solar cells prepared using RF (27.1 MHz) excitation frequency. The influence of the power...
The passivation effects for multicrystalline silicon solar cell with different configurations are investigated. Al2O3 and SiO2 films are used as the passivation layer in this work. They are prepared by atomic layer deposition and thermal oxidation, respectively. Using monolayer (Al2O3 or SiO2) as the passivation layer, the cell efficiency is 16.33% and 17.41%, respectively. The excellent passivation...
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