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This work reports on the fabrication, characterization and modeling of single electron transistor behavior in gate-all-around silicon nanoscale MOS devices. Polysilicon-gated nanowire transistors with triangular cross-sections, ranging from 20 to 250nm are fabricated by an original isotropic etching technique resulting in localized-SOI on bulk-Si wafers. Low temperature (T<20K) characteristics...
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