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Thin silicon foils with two different crystal orientation were fabricated by SLiM-cut method. The thickness of the <100> and <111> foils are 45 µm and 33 µm, respectively. The surface quality was compared in this study. The <111> foil have smoother surface than the <100> foil. 4cm2 thin silicon solar cells with heterojunction structure were fabricated. The efficiency was found...
A novel process of making ultra-thin silicon wafer by Thermal-stress Induced Pattern Transfer (TIPT) method was reported. The method employs three steps, first a silicon thin film was deposited on a sapphire substrate by plasma enhanced chemical vapor deposition. Second, metal paste was printed on the silicon layer, and finally a thermal annealing process was carried out. After cooling down, the silicon...
An efficient suppression of reflection in a broad spectral range can be achieved when the textured scale is comparable to the wavelength of incident light. The nano-scale texturing method is, therefore, attracting many interests in many fields. In this study, a fast nano-scale texturing method for the crystalline silicon substrate has been provided. By using the self-assembly polymer mask and wet...
The passivation effects for multicrystalline silicon solar cell with different configurations are investigated. Al2O3 and SiO2 films are used as the passivation layer in this work. They are prepared by atomic layer deposition and thermal oxidation, respectively. Using monolayer (Al2O3 or SiO2) as the passivation layer, the cell efficiency is 16.33% and 17.41%, respectively. The excellent passivation...
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