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The gate leakage reduction about four to seven orders of magnitude for HfO2 MOSHFETs (~10−10A/mm at −15V) prepared by Atomic Layer Deposition (ALD) technique at 350°C with and without oxygen-plasma treatment in comparison to HFET, was observed. A lower hysteresis evaluated from c-V curves of MOSHFET with oxygen-plasma treatment (OPT) after annealing (500°C for 15 min in N2) was found. The C-V curve...
The RF performance of lattice-matched InAlN/GaN heterostructure field-effect transistors (HFETs) and Al2O3/InAlN/GaN metal-oxide-semiconductor HFETs (MOSHFETs) with varied gate length was evaluated. The current gain cutoff frequency fT and the maximum oscillation frequency fmax for the HFETs with 0.3-μm gate length were 54 and 58 GHz, respectively. An increase of fT to 61 GHz and offmax to 70 GHz...
Thermal annealing was used to investigate traps at the surface of AlGaN/GaN HFETs and Al2O3/AIGaN/GaN MOSHFETs. The C-V and static output and transfer measurement yielded nearly identical characteristics for unannealed and annealed structures, regardless whether unpassivated or gate-oxide structures were used. A strong influence of the annealing on the gate leakage current was observed. The leakage...
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