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TSV (through silicon via) is a core technology in 3D IC package. The micro vias can be made by etching or laser drilling. Standard processes for TSV filling begin with seed layer deposition, followed by blind vias copper electroplating. If the aspect ratio of the TSV is higher than 5:1, the costly MOCVD process needs to be used to deposit the seed layer with good step coverage. A special designed...
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