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The DC abnormal-glow discharges with magnetic field assistance near the cathode targets are particularly useful in magnetron sputtering and are extensively used in industrial plasma processing applications [Thornton JA. J Vacuum Sci Technol 1978; 15(2): 171–177].In this work, an experimental study of the magnetic field influence on planar magnetron abnormal-glow discharges of argon on copper targets...
In magnetrons the magnetic field confines partially the electron swarm in a trap near the cathode increasing sputtering yield and deposition rates. The magnetic field also decreases the ignition voltage even at relatively low pressures thus allowing sputtering at lower pressures. Under this conditions fewer collisions, less diffusion and less thermalization of the sputtered atoms occur during the...
Shape memory alloy Ni-Ti thin films as sputtered are amorphous if the substrate is not intentionally heated during deposition. Therefore, these films have to be heat treated to induce crystallization in order to exhibit the shape-memory effect. Several films have been prepared by dc magnetron sputtering and then studied concerning the influence of the type of substrate (single-crystal Si, polycrystalline...
Hollow magnetron cathodes are particularly useful in coating parts with cylindrical symmetry and when deposition must be centripetal; this is the case when coating the outside of tubular and long substrates. A hollow magnetron cathode and its vacuum system has been designed and constructed to coat 2m long heat pipe absorbers and fluid pipe absorber tubes with a selective film of aluminum nitride....
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