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The organic contamination has been recently considered as the most important problem for the photolithography world in the semiconductor industry, especially when the photolithographic methods moved from 130nm node to 32nm node. One of the most common organic compounds found in photolithography areas of the clean room is Trimethylsilanol (TMS), which can adsorb on the optical lenses forming a thin...
Microelectronic wafers are exposed to airborne molecular contamination (AMC) during the fabrication process of microelectronic components. The organophosphate compounds belonging to the dopant group are one of the most harmful groups. Once adsorbed on the wafer surface these compounds hardly desorb and could diffuse in the bulk of the wafer and invert the wafer from p-type to n-type. The presence...
To prevent the degradation of the device characteristics it is important to detect the organic contaminants adsorbed on the wafers. In this respect, a reliable qualitative and quantitative analytical method for analysis of semi-volatile organic compounds which can adsorb on wafer surfaces is of paramount importance.Here, we present a new analytical method based on Wafer Outgassing System (WOS) coupled...
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