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Remote plasma sources (RPS) are used in microelectronics fabrication to produce fluxes of radicals for etching and surface passivation in the absence of damage that may occur by charging and energetic ion bombardment. RPS reactors typically use flow distance and grids to reduce or eliminate charged particle fluxes from reaching the surface of the material being treated. Nitrogen trifluoride (NF3)...
The highly directional interactions among complex gelators of 2,6-pyridinedicarboxylic acid and 4-hydroxypyridine are investigated, which lead to the formation of ordered one-dimensional fibers with diameters of 500nm~2μm. By scanning electron microscopy (SEM), Fourier transform infrared (FT-IR) spectroscopy, 1 H nuclear magnetic resonance ( 1 H NMR) spectroscopy, ultraviolet–visible...
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