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Advanced high performance dark field (DF) inspection is usually utilized at larger defects and the excursions in etch, chemical mechanical polish (CMP) or film deposition processes inspection at high production throughputs. Here demonstrates risky scratch defects right after post poly-silicon CMP captured by DF inspection technique.
Advanced bright field (BF) inspection tool bundles with many powerful features to improve its resolution and sensitivity. However, it usually takes much time for creating an effective monitoring recipe for suppressing the background signal. This paper demonstrates the benefit of BF dark mode inspection for suppressing the interferences of nuisance and pre-layer.
• Advanced Bright Field Inspection Tools: Advanced bright field Inspection tools can provide better WPH, less time to setup recipes, higher sensitivities benefits. However, metal grains suppression still a big challenge for inspection. • Metal Grain Suppression : Series methodologies for suppressing metal grain are demonstrated, it indicated that metal grains suppression can not fulfill by single...
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