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The n-type hydrogenated microcrystalline silicon-incorporated silicon oxide (n-μc-SiO:H) films are prepared by 13.56 MHz plasma enhanced chemical vapor deposition (rf-PECVD) using SiH4, H2 and CO2 gases for an inter-layer between the amorphous silicon (a-Si:H) top-cell and the microcrystalline silicon (μc-Si:H) bottom-cell in the thin-film silicon tandem solar cells. The optical and electrical properties...
The properties of unsaturated polyester (UP)/montmorillonite (MMT) nanocomposite greatly depend on the preparation procedure because of the chemical reactions and physical interactions involved. To investigate the properties and formation mechanism of UP/MMT nanocomposite, samples were prepared by two different mixing methods. The first method, simultaneous mixing, is similar to the method used for...
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