The Infona portal uses cookies, i.e. strings of text saved by a browser on the user's device. The portal can access those files and use them to remember the user's data, such as their chosen settings (screen view, interface language, etc.), or their login data. By using the Infona portal the user accepts automatic saving and using this information for portal operation purposes. More information on the subject can be found in the Privacy Policy and Terms of Service. By closing this window the user confirms that they have read the information on cookie usage, and they accept the privacy policy and the way cookies are used by the portal. You can change the cookie settings in your browser.
The chemical reactions at the higher-k LaLuO3/Ti1NX/poly-Si gate stack interfaces are studied after high temperature treatment. A Ti-rich TiN metal layer degrades the gate stack performance after high temperature annealing. The gate stack containing TiN/LaLuO3 with a near stoichiometric TiN layer is stable during 1000 °C, 5s anneals. Both electrical and structural characterization methods are employed...
The implementation of more powerful materials into leading edge CMOS devices allows performance improvements without scaling and without changing the circuit design libraries. This highly motivates the research on novel materials. In this paper we present various transistor fabrication processes like “gate first” and “replacement gate” for different channel stack configurations like strained Si, strained...
Long channel n-MOSFETs on thin SOI and sSOI substrates have been prepared integrating gadolinium scandate as high-kappa gate dielectric in a gate last process. The GdScCh films were deposited by electron beam evaporation and subsequently annealed in oxygen atmosphere. Electrical characterization of readily processed devices reveal well behaved output and transfer characteristics with high Ion/Ioff...
Set the date range to filter the displayed results. You can set a starting date, ending date or both. You can enter the dates manually or choose them from the calendar.