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We studied ultraviolet micro imprint lithography (UV-MIL) for the manufacture of amorphous silicon (a-Si) thin-film transistors (TFTs) using a master mold. A teflon amorphous fluoropolymer produced by rotary vacuum evaporation was used to detach the imprint resist from a master mold. To remove the residual resist layer, the sample was dipped in acetone and then dry etched by reactive ion etching....
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